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  #1  
Old 04-13-2007, 09:41 AM
ResidualStressMan ResidualStressMan is offline
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Default Polishing Zirconium Oxide

I have recently been trying to polish a sample coating of zirconium oxide, in order to measure the residual stresses deeper in the coating.

In looking for an effective way of doing this the only things I have been able to find online are plasma methods and methods involving hydro-flouric acid. Ideally I want to stay away from using HF for obvious health reasons.

Anyone have any advice?
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Old 06-13-2007, 04:20 PM
Robert Robert is offline
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Default Re: Polishing Zirconium Oxide

Hmm. I would expect it could be quite difficult.
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Old 07-31-2007, 10:10 AM
ResidualStressMan ResidualStressMan is offline
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Default Re: Polishing Zirconium Oxide

In relation to this question, a collegue of mine recently attempted to polish a plate coated in yytrium oxide. He tried using different acids (such as phosphoric acid, nitric acid, sulfuric acid, hydroflouric acid, hydrochloric acid) and even tried ammonium hydroxide.

Nothing worked for him to remove material. He did say that a mixture of nitric and hydroflouric acids caused the material to flake off the substrate, but no polishing to the ceramic was done.

Do you think this could be a major problem to ceramics, since they will not be able to measure 'stress vs. depth' profiles?
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